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Head-to-head · 32 cross-admits

When applicants got into both, 88% chose IIT-Kent. Side-by-side on admissions, costs, and outcomes — sourced from 32 self-reported decisions and ABA 509 filings.

Choice, not ranking

These are decisions, not opinions. Scholarship offers, location, intended practice, and personal fit are all priced into the split.

32
cross-admits
10
cycles
+0pt
YoY shift

Cross-admit decision

Of 32 applicants admitted to both schools
Last 5 cycles
Illinois Institute of Technology (Kent) logo Chose IIT-Kent
88%
Chose DePaul DePaul University logo
12%

Median scholarship (chose IIT-Kent)

$120,000 / yr

Median scholarship (chose DePaul)

$105,000 / yr
View all-time (96 cross-admits)
92% chose IIT-Kent 8% chose DePaul

Trend · IIT-Kent's share

2003–2025

Lowest cycle

67%

Highest cycle

100%
10 cycles
100 50 0 03 04 05 06 07 08 20 23 24 25 2003: 100% 2004: 100% 2005: 83% 2006: 88% 2007: 100% 2008: 67% 2020: 100% 2023: 100% 2024: 85% 2025: 100%
IIT-Kent #70 · DePaul #123 LSD n≈6/yr

Admissions

Rankings, LSAT/GPA, acceptance & yield
2025 ABA 509
Metric
Illinois Institute of Technology (Kent) logo
IIT-Kent
Chicago, Illinois
DePaul University logo
DePaul
Chicago, Illinois
USN Rank
#105
#131
LSD Rank
Top 75 (0.004)
75+ (0.001)
LSAT 25th
156
154
LSAT Median
161
158
LSAT 75th
164
160
GPA Median
3.72
3.61
Acceptance Rate
38.6%
34.8%
Class Size
245
186
Yield Rate
28.6%
20.1%

Financial

Sticker price, scholarships, and debt burden
2025 ABA 509
Metric
Illinois Institute of Technology (Kent) logo
IIT-Kent
Chicago, Illinois
DePaul University logo
DePaul
Chicago, Illinois
Tuition (In-State)
-
$55,328
Tuition (Out-of-State)
-
$55,328
Median Grant
$35,000
$34,950
% Receiving Grants
92.0%
99.0%
Avg. Debt at Graduation
-
-

Employment & outcomes

Post-graduation placement and bar passage
2024 ABA Employment
Metric
Illinois Institute of Technology (Kent) logo
IIT-Kent
Chicago, Illinois
DePaul University logo
DePaul
Chicago, Illinois
BigLaw (501+)
10.3%
7.8%
Judicial Clerkships
3.8%
2.2%
Median Salary (Private)
$120,000
$90,000
Employment Rate
87.2%
86.6%
Bar Pass Rate
79.0%
76.0%

Overview

About IIT-Kent vs DePaul

Across 32 applicants admitted to both schools and self-reporting on LSD, 88% enrolled at Illinois Institute of Technology (Kent) and 12% at DePaul University.

These numbers reflect every factor that goes into a real decision: scholarship offers, geographic preference, intended practice area, and fit. Choosing one school doesn't mean it's "better" — it means the pool of cross-admits, weighing their options, ended up there more often. Pair this with the scholarship distribution and employment outcomes above for full context.

Looking at a different matchup? Browse all comparisons or run a custom pair from the index.

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Detailed comparison narrative

This page compares Illinois Institute of Technology (Kent) and DePaul University across admissions data, cost of attendance, and employment outcomes — plus cross-admit decision data from 32 applicants admitted to both.

Based on 32 applicants admitted to both schools, 88% chose to attend Illinois Institute of Technology (Kent). This cross-admit data reflects real enrollment decisions from verified law school applicants on LSD.Law.

In the U.S. News rankings, Illinois Institute of Technology (Kent) is ranked #105 compared to #131 — a gap of 26 positions that often correlates with differences in employment outcomes and peer assessment scores.

Both schools are located in Illinois — Illinois Institute of Technology (Kent) in Chicago and DePaul University in Chicago — meaning graduates often compete in the same regional legal market.

On cost, Illinois Institute of Technology (Kent) has lower tuition at - per year compared to $55,328. Combined with employment rates of 87.2% (IIT-Kent) and 86.6% (DePaul), prospective students should weigh the cost-to-outcome ratio carefully.

Among cross-admitted applicants, Illinois Institute of Technology (Kent) offered a median scholarship of $120,000 compared to $105,000, a difference of $15,000 that may factor into enrollment decisions.